博士生导师 硕士生导师 学位:博士 性别:男 毕业院校:东京工业大学 所在单位:材料科学与工程学院 电子邮箱:tanyi@dlut.edu.cn
论文名称:A novel method to optimize the growth of crystal silicon-Current assisted directional solidification 发表刊物:JOURNAL OF CRYSTAL GROWTH 卷号:617 ISSN号:0022-0248 关键字:GRAIN-BOUNDARY GROOVES; INTERFACE; SEGREGATION
上一条:Effect of oxygen on the wettability and interfacial reaction between the DD5 superalloy and ceramic shell
下一条:Effect of metal impurities concentration on electrical properties in N-type Recharged-Czochralski silicon