谭毅Yi Tan

(教授)

 博士生导师  硕士生导师
学位:博士
性别:男
毕业院校:东京工业大学
所在单位:材料科学与工程学院
电子邮箱:tanyi@dlut.edu.cn

论文成果

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Evaluation on electrical resistivity of silicon materials after electron beam melting

发表时间:2019-03-09 点击次数:

论文名称:Evaluation on electrical resistivity of silicon materials after electron beam melting
论文类型:期刊论文
发表刊物:BULLETIN OF MATERIALS SCIENCE
收录刊物:SCIE、EI、Scopus
卷号:38
期号:5
页面范围:1429-1433
ISSN号:0250-4707
关键字:Electron beam melting; silicon; oxygen; removal; electrical resistivity
摘要:This research deals with the study of electron beam melting (EBM) methodology utilized in melting silicon material and subsequently discusses on the effect of oxygen level on electrical resistivity change after EBM process. The oxygen content was reduced from 6.177 to less than 0.0517 ppmw when refining time exceeded 10 min with removal efficiency of more than 99.08%. The average value of electrical resistivity of silicon before EBM processing was recorded to be 2.25 Omega cm but with the increase in melting time that was applied through EBM, the electrical resistivity was recorded to go high in the range of 4-13 Omega cm for different regions. The electrical resistivity values were greater in the top and the bottom regions, whereas lowest in the central region at all conditions of melting time. It is the result of the evaporation of oxygen during melting process and the segregation of metal impurities during solidification.
发表时间:2015-09-01