location: Current position: Home >> Scientific Research >> Paper Publications

Quasi-freestanding epitaxial silicene on Ag(111) by oxygen intercalation

Hits:

Indexed by:期刊论文

Date of Publication:2016-07-01

Journal:SCIENCE ADVANCES

Included Journals:SCIE、EI、PubMed、Scopus

Volume:2

Issue:7

Page Number:e1600067

ISSN No.:2375-2548

Key Words:DFT,Silicene,angle-resolved photoemission spectroscopy,intercalation,quasi-free-standing,scanning tunneling microscopy

Abstract:Silicene is a monolayer allotrope of silicon atoms arranged in a honeycomb structure with massless Dirac fermion characteristics similar to graphene. It merits development of silicon-based multifunctional nanoelectronic and spin-tronic devices operated at room temperature because of strong spin-orbit coupling. Nevertheless, until now, silicene could only be epitaxially grown on conductive substrates. The strong silicene-substrate interaction may depress its superior electronic properties. We report a quasi-freestanding silicene layer that has been successfully obtained through oxidization of bilayer silicene on the Ag(111) surface. The oxygen atoms intercalate into the underlayer of silicene, resulting in isolation of the top layer of silicene from the substrate. In consequence, the top layer of silicene exhibits the signature of a 1 x 1 honeycomb lattice and hosts massless Dirac fermions because of much less interaction with the substrate. Furthermore, the oxidized silicon buffer layer is expected to serve as an ideal dielectric layer for electric gating in electronic devices. These findings are relevant for the future design and application of silicene-based

Pre One:新型低密度硅相的电子结构和热电性能

Next One:Unreacted equation of states of typical energetic materials under static compression: A review