location: Current position: Home >> Scientific Research >> Paper Publications

反应射频磁控溅射制备HfTaO薄膜的热稳定性和光学性能

Hits:

Indexed by:期刊论文

Date of Publication:2012-01-01

Journal:功能材料

Included Journals:PKU、ISTIC

Volume:10

Issue:43

Page Number:1268-1272

Pre One:脉冲激光沉积制备Co 掺杂ZnO 薄膜的磁学性质研究

Next One:射频磁控溅射制备HfLaO薄膜结构和光学性能研究