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反应射频磁控溅射制备HfTaO薄膜的热稳定性和光学性能

Release Time:2019-03-12  Hits:

Indexed by: Journal Article

Date of Publication: 2012-01-01

Journal: 功能材料

Included Journals: ISTIC、PKU

Volume: 10

Issue: 43

Page Number: 1268-1272

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