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Indexed by:期刊论文

Date of Publication:2014-01-01

Journal:Advanced Materials Research

Included Journals:EI

Volume:1053

Page Number:343-350

ISSN No.:10226680

Abstract:HfO2 films were sputter deposited under varying substrate temperatures (Ts) and their structural and morphological characteristics, optical properties were systematically studied by means of X-ray diffraction (XRD), atomic force microscope (AFM), and UV/VIS spectrophotometry. A statistical analysis based on multifractal formalism shows the uniformity of the height distribution increases as Ts is increased and the widths Δα of multifractal spetra are related to the average grain size D(-111) as Δα ~ [D(-111)]-0.83. The monoclinic HfO2 is highly oriented along (-111) direction with increasing Ts. The Lattice expansion increases with diminishing HfO2 crystalline size below 7 nm while maximum lattice expansion occurs with highly oriented monoclinic HfO2 of crystalline size about 14.8 nm. The film growth process at Ts ³ 200oC with surface diffusion energy of  ?0.29 eV is evident from the structural analysis of HfO2 films.