location： Current position: Home >> Scientific Research >> Paper Publications

Formation mechanism of cobalt silicide on silica by chemical vapor deposition of Co(SiCl3)(CO)4

Hits:

Indexed by:期刊论文

Date of Publication:2011-01-01

Journal:Phys. Chem. Chem. Phys.

Volume:13

Issue:20

Page Number:9432-9438

Pre One:Structural rearrangements of Ru nanoparticles supported on CNTs under microwave irradiation

Next One:H2S和喹啉对NiWS/γ-Al2O3催化剂上吲哚加氢脱氮反应的影响
Recommended Ph.D.Supervisor Recommended MA Supervisor Institutional Repository Personal Page

Address: No.2 Linggong Road, Ganjingzi District, Dalian City, Liaoning Province, P.R.C., 116024

Click : times
  • MOBILE Version
    •
    Open time:..
    The Last Update Time:..

    Mobile phone sweep