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    • 副研究员     博士生导师   硕士生导师
    • 性别:男
    • 毕业院校:大连理工大学
    • 学位:博士
    • 所在单位:机械工程学院
    • 学科:机械电子工程. 精密仪器及机械
    • 办公地点:机械工程学院东楼2193
    • 联系方式:0411-84707713-2193 xuzheng@dlut.edu.cn
    • 电子邮箱:xuzheng@dlut.edu.cn

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    Fabrication of a three-layer SU-8 mould with inverted T-shaped cavities based on a sacrificial photoresist layer technique

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    论文类型:期刊论文

    发表时间:2014-10-01

    发表刊物:BIOMEDICAL MICRODEVICES

    收录刊物:SCIE、EI、PubMed

    卷号:16

    期号:5

    页面范围:655-660

    ISSN号:1387-2176

    关键字:SU-8 mould; PDMS; Cast moulding; Sacrificial layer

    摘要:A novel method for fabricating a three-layer SU-8 mould with inverted T-shaped cavities is presented. The first two SU-8 layers were spin coated and exposed separately, and simultaneously developed to fabricate the bottom and the horizontal part of the inverted T-shaped cavity. Then, a positive photoresist was filled into the cavity, and a wet lapping process was performed to remove the excess photoresist and make a temporary substrate. The third SU-8 layer was spin coated on the temporary substrate to make the vertical part of the inverted T-shaped cavity. The sacrificial photoresist layer can prevent the first two SU-8 layers from being secondly exposed, and make a temporary substrate for the third SU-8 layer at the same time. Moreover, the photoresist can be easily removed with the development of the third SU-8 layer. A polydimethylsiloxane (PDMS) microchip with arrays of T-shaped cantilevers for studying the mechanics of cells was fabricated by using the SU-8 mould.