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个人信息Personal Information
教授
博士生导师
硕士生导师
主要任职：Professor Dr. Hongbin Ding
其他任职：物理学院学术委员会主任，等离子体联合研究中心主任,中国光学工程学会LIBS专委会副主任, 中国核学会核聚变等离子体分会常务理事，辽宁省物理学会副理事长，国际ITER-ITPA 委员
性别：男
毕业院校：巴塞尔大学
学位：博士
所在单位：物理学院
学科：等离子体物理. 光学工程
联系方式：hding@dlut.edu.cn
电子邮箱：hding@dlut.edu.cn
Determination of the number densities of CH((XI)-I-2 ) and CH(A(2)Delta) radicals in a DC cascaded arc discharge plasma
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论文类型：期刊论文
发表时间：2015-09-01
发表刊物：APPLIED PHYSICS B-LASERS AND OPTICS
收录刊物：SCIE、EI、Scopus
卷号：120
期号：4
页面范围：659-666
ISSN号：0946-2171
摘要：A combination of optical emission spectroscopy (OES) and cavity ring-down spectroscopy (CRDS) has enabled to determinate the number densities of CH(A(2)Delta) and CH((XI)-I-2 ) radicals simultaneously in a cascaded arc plasma reactor operating with a CH4/Ar mixture. It is found that the number density of CH(A(2)Delta) radical increases with discharge current at first and then decreases. However, the number density of CH((XI)-I-2 ) radical decreases with discharge current when the rate of CH4 flow to total flow is lower than 1 %, while it increases slightly with discharge current when the rate is 1.5 %. The results reveal that CH radicals are deviation from excitation equilibrium. Although OES is the simplest and most straightforward means to investigate the CH radical behavior, it is not enough to provide the information of the CH((XI)-I-2 ) number density, and additional methods, such as CRDS, are needed in the cascaded arc plasma jet.