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个人信息Personal Information
教授
博士生导师
硕士生导师
主要任职：光电工程与仪器科学学院副院长
其他任职：Faculty director of Instrumentation Science
性别：男
毕业院校：日本富山大学
学位：博士
所在单位：光电工程与仪器科学学院
学科：微电子学与固体电子学. 测试计量技术及仪器
办公地点：厚望楼 318
联系方式：chen_xm@dlut.edu.cn 0411-84706660
电子邮箱：chen_xm@dlut.edu.cn
Influence of lithography distortion due to metal fill on CA
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论文类型：会议论文
发表时间：2014-01-18
收录刊物：EI、Scopus
卷号：900
页面范围：651-655
摘要：In the process of integrated circuit design and manufacturing, dummy metal fill can improve the planarity of layout after Chemical Mechanical Polishing (CMP). However, it will also cause lithography distortion and Critical Area (CA) variation. This paper compares and analyzes the influences of lithography distortion due to metal fill on CA from the perspectives of different defect particles based on 45nm technology node. The results indicate that dummy metal fill can increase open CA after lithography and the defect particle with the diameter of 0.066um leads to the largest increment percentage of open CA, which will take up almost 10%. This paper is instructive in researching dummy metal fill and CA or related fields in the future. ? (2014) Trans Tech Publications, Switzerland.