个人信息Personal Information
副教授
博士生导师
硕士生导师
性别:男
毕业院校:日本东北大学
学位:博士
所在单位:材料科学与工程学院
电子邮箱:w-dong@dlut.edu.cn
STUDY ON PRECIPITATION AND DISSOLUTION OF INTERFACIAL CU6SN5 DURING THERMOMIGRATION
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论文类型:会议论文
发表时间:2016-03-13
收录刊物:EI、CPCI-S
摘要:Synchrotron radiation real-time imaging technology was used to in situ study the precipitation and dissolution behavior of interfacial CusSns under temperature gradient during soldering. At the cold end, the pre-formed CusSns grains continued to grow at a fast rate with increasing aspect ratio. Whereas at the hot end, the pre-formed CusSns grains dissolved into the liquid solder rapidly then maintained as an extremely thin, scallop-like IMC layer. The thermomigration of Cu atoms from the hot end towards the cold end was responsible for the asymmetrical morphology of the interfacial CusSns between the cold and hot ends.