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Recrystallization Behavior of a Multiscalar Microlaminate

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Indexed by:期刊论文

Date of Publication:2011-07-01

Journal:RARE METAL MATERIALS AND ENGINEERING

Included Journals:SCIE、PKU、ISTIC

Volume:40

Page Number:498-502

ISSN No.:1002-185X

Key Words:electron beam physical vapor deposition (EB-PVD); microlaminates; recrystallization

Abstract:A multiscalar microlaminate, NiCoCrAl/ZrO(2)-8Y(2)O(3) was annealed in vacuum at 1050 degrees C for 0.5, 2 and 4 h, respectively. The microlaminate comprised metal/ceramic thin stacks and tough phase layers with thickness ranging from 5 mu m to 25 mu m. After annealing, the variation in microstructure of metal layers of the microlaminate depended on their layer-thicknesses. The metal-layers with layer-thicknesses more than 20 mu m was more difficult to be recrystallized than those with layer-thicknesses less than 13 mu m. And when the thicknesses of the metal layers were less than 13 mu m, recrystallized grain sizes increased with the increasing layer-thickness. Furthermore, the mechanism of recrystallization for the metal-layers with different thicknesses was discussed.

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