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Recrystallization Behavior of a Multiscalar Microlaminate

Release Time:2019-10-10  Hits:

Indexed by: Journal Article

Date of Publication: 2011-07-01

Journal: RARE METAL MATERIALS AND ENGINEERING

Included Journals: ISTIC、PKU、SCIE

Volume: 40

Page Number: 498-502

ISSN: 1002-185X

Key Words: electron beam physical vapor deposition (EB-PVD); microlaminates; recrystallization

Abstract: A multiscalar microlaminate, NiCoCrAl/ZrO(2)-8Y(2)O(3) was annealed in vacuum at 1050 degrees C for 0.5, 2 and 4 h, respectively. The microlaminate comprised metal/ceramic thin stacks and tough phase layers with thickness ranging from 5 mu m to 25 mu m. After annealing, the variation in microstructure of metal layers of the microlaminate depended on their layer-thicknesses. The metal-layers with layer-thicknesses more than 20 mu m was more difficult to be recrystallized than those with layer-thicknesses less than 13 mu m. And when the thicknesses of the metal layers were less than 13 mu m, recrystallized grain sizes increased with the increasing layer-thickness. Furthermore, the mechanism of recrystallization for the metal-layers with different thicknesses was discussed.

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