高岩

个人信息Personal Information

教授

博士生导师

硕士生导师

任职 : 精细化工国家重点实验室,副主任

性别:男

毕业院校:大连理工大学

学位:博士

所在单位:化工学院

学科:应用化学. 精细化工

办公地点:大连理工大学西部校区化工实验楼F-212A

联系方式:0411-84986249

电子邮箱:dr.gaoyan@dlut.edu.cn

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Copper Oxide Film In-situ Electrodeposited from Cu(II) Complex as Highly Efficient Catalyst for Water Oxidation

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论文类型:期刊论文

发表时间:2017-03-10

发表刊物:ELECTROCHIMICA ACTA

收录刊物:SCIE、EI、Scopus

卷号:230

页面范围:501-507

ISSN号:0013-4686

关键字:Water oxidation; Electrodeposition; Copper based film; Electrocatalyst

摘要:Water splitting is deemed as an effective pathway for producing ideal clean energy, such as hydrogen. Here, a copper oxide film (Cu-Tris film) was prepared in-situ from a 0.2 M phosphate buffer solution (pH =12.0) containing 1.0mM Cu2+ and 2.0mM Tris via controlled-potential electrodeposition. The CuTris film showed a significantly low overpotential of 390 mV at a cdrrent density of 1.0 mA/cm(2) for electrocatalytic water oxidation. Simultaneously, a considerably low Tafel slope of 41 mV/decade was achieved. This Cu-Tris film also exhibited a high and stable current derfSity of ca. 7.5 mA/cm(2) at 1.15 V vs. NHE for long-term electrocatalysis (10 h). These results demonstrated the superior performance of the developed Cu-Tris film, which should be attributed to the regulating effect of the five coordinated planar structure of the Cu-Tris complex precursor during the process of electrodeposition. (C) 2017 Elsevier Ltd. All rights reserved.