个人信息Personal Information
教授
博士生导师
硕士生导师
主要任职:物理学院院长、党委副书记
性别:男
毕业院校:大连理工大学
学位:博士
所在单位:物理学院
学科:等离子体物理
办公地点:物理楼402办公室
联系方式:86-411-84708983
电子邮箱:zxwang@dlut.edu.cn
Impurity effects on trapped electron mode in tokamak plasmas
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论文类型:期刊论文
发表时间:2016-07-01
发表刊物:PHYSICS OF PLASMAS
收录刊物:SCIE、EI
卷号:23
期号:7
ISSN号:1070-664X
摘要:The effects of impurity ions on the trapped electron mode (TEM) in tokamak plasmas are numerically investigated with the gyrokinetic integral eigenmode equation. It is shown that in the case of large electron temperature gradient (eta(e)), the impurity ions have stabilizing effects on the TEM, regardless of peaking directions of their density profiles for all normalized electron density gradient R/L-ne. Here, R is the major radius and L-ne is the electron density gradient scale length. In the case of intermediate and/or small eta(e), the light impurity ions with conventional inwardly (outwardly) peaked density profiles have stabilizing effects on the TEM for large (small) R/L-ne, while the light impurity ions with steep inwardly (outwardly) peaked density profiles can destabilize the TEM for small (large) R/L-ne. Besides, the TEM driven by density gradient is stabilized (destabilized) by the light carbon or oxygen ions with inwardly (outwardly) peaked density profiles. In particular, for flat and/or moderate R/L-ne, two independent unstable modes, corresponding respectively to the TEM and impurity mode, are found to coexist in plasmas with impurity ions of outwardly peaked density profiles. The high Z tungsten impurity ions play a stronger stabilizing role in the TEM than the low Z impurity ions (such as carbon and oxygen) do. In addition, the effects of magnetic shear and collision on the TEM instability are analyzed. It is shown that the collisionality considered in this work weakens the trapped electron response, leading to a more stable TEM instability, and that the stabilizing effects of the negative magnetic shear on the TEM are more significant when the impurity ions with outwardly peaked density profile are taken into account. Published by AIP Publishing.