Hits:

Date of Publication:2024-10-30

Journal:Optics and Precision Engineering

Volume:32

Issue:16

Page Number:2492-2503

ISSN No.:1004-924X

Key Words:Anisotropic etching; Average deviation; Crystal whiskers; Curvature radius; High mechanical strength; Lateral erosion compensation; Microelectroforming; Microelectroforming technique; Microneedle arrays; Microneedles; Monocrystalline silicon; Ni microneedle array; Photoresists; Silicon compounds; Silicon template

CN No.:22-1198/TH