个人信息Personal Information
工程师
性别:男
毕业院校:上海交通大学
学位:硕士
所在单位:机械工程学院
电子邮箱:phyin@dlut.edu.cn
Fabrication of a three-layer SU-8 mould with inverted T-shaped cavities based on a sacrificial photoresist layer technique
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论文类型:期刊论文
发表时间:2014-10-01
发表刊物:BIOMEDICAL MICRODEVICES
收录刊物:SCIE、EI、PubMed
卷号:16
期号:5
页面范围:655-660
ISSN号:1387-2176
关键字:SU-8 mould; PDMS; Cast moulding; Sacrificial layer
摘要:A novel method for fabricating a three-layer SU-8 mould with inverted T-shaped cavities is presented. The first two SU-8 layers were spin coated and exposed separately, and simultaneously developed to fabricate the bottom and the horizontal part of the inverted T-shaped cavity. Then, a positive photoresist was filled into the cavity, and a wet lapping process was performed to remove the excess photoresist and make a temporary substrate. The third SU-8 layer was spin coated on the temporary substrate to make the vertical part of the inverted T-shaped cavity. The sacrificial photoresist layer can prevent the first two SU-8 layers from being secondly exposed, and make a temporary substrate for the third SU-8 layer at the same time. Moreover, the photoresist can be easily removed with the development of the third SU-8 layer. A polydimethylsiloxane (PDMS) microchip with arrays of T-shaped cantilevers for studying the mechanics of cells was fabricated by using the SU-8 mould.