尹鹏和

个人信息Personal Information

工程师

性别:男

毕业院校:上海交通大学

学位:硕士

所在单位:机械工程学院

电子邮箱:phyin@dlut.edu.cn

扫描关注

论文成果

当前位置: 中文主页 >> 科学研究 >> 论文成果

Fabrication of a three-layer SU-8 mould with inverted T-shaped cavities based on a sacrificial photoresist layer technique

点击次数:

论文类型:期刊论文

发表时间:2014-10-01

发表刊物:BIOMEDICAL MICRODEVICES

收录刊物:SCIE、EI、PubMed

卷号:16

期号:5

页面范围:655-660

ISSN号:1387-2176

关键字:SU-8 mould; PDMS; Cast moulding; Sacrificial layer

摘要:A novel method for fabricating a three-layer SU-8 mould with inverted T-shaped cavities is presented. The first two SU-8 layers were spin coated and exposed separately, and simultaneously developed to fabricate the bottom and the horizontal part of the inverted T-shaped cavity. Then, a positive photoresist was filled into the cavity, and a wet lapping process was performed to remove the excess photoresist and make a temporary substrate. The third SU-8 layer was spin coated on the temporary substrate to make the vertical part of the inverted T-shaped cavity. The sacrificial photoresist layer can prevent the first two SU-8 layers from being secondly exposed, and make a temporary substrate for the third SU-8 layer at the same time. Moreover, the photoresist can be easily removed with the development of the third SU-8 layer. A polydimethylsiloxane (PDMS) microchip with arrays of T-shaped cantilevers for studying the mechanics of cells was fabricated by using the SU-8 mould.