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Fabrication of graphitic-C3N4 quantum dots coated silicon nanowire array as a photoelectrode for vigorous degradation of 4-chlorophenol

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Indexed by:Journal Papers

Date of Publication:2017-03-01

Journal:RSC Advances

Included Journals:SCI

Volume:7

Issue:24

Page Number:14832–14836

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20 2017 孙波 RSC Adv.pdf

Pre One:A Structured Macroporous Silicon/Graphene Heterojunction for Efficient Photoconversion

Next One:Decoration of Si-nanowires- grafted Si micropillar array with Ag nanoparticles for photoelectrocatalytic dechlorination of 4-chlorophenol
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