Current position: Home >> Scientific Research >> Research Projects

铁电性HfO2基薄膜的自发极化起源与宏观电学性能研究

Hits:

Leading Scientist:Dayu ZHOU

Supported by:其他课题

Sub-Class of Project:实验室开放课题

Status:结题

Supported by:电子薄膜与集成器件国家重点实验室开放课题

Nature of Project:纵向

Project Approval Number:KFJJ201101

Date of Project Approval:2011-11-03

Scheduled completion time:2013-10-20

Date of Project Initiation:2011-10-20

Date of Project Completion:2013-10-20

Pre One:翻译服务合同