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铁电性HfO2基薄膜的自发极化起源与宏观电学性能研究

Release Time:2016-08-09  Hits:

Leading Scientist: Dayu ZHOU

Project Source: 其他课题

Sub-Class of Project: 实验室开放课题

Status: 结题

Supported by: National Key Laboratory of Electronic Thin Films and Integrated Devices Open Project

Nature of Project: 纵向

Project Approval Number: KFJJ201101

Date of Project Approval: 2011-11-03

Scheduled Completion Time: 2013-10-20

Date of Project Initiation: 2011-10-20

Date of Project Completion: 2013-10-20

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