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Si掺杂HfO_2薄膜的铁电和反铁电性质

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Date of Publication:2014-01-01

Journal:物理学报

Affiliation of Author(s):材料科学与工程学院

Volume:63

Issue:11

Page Number:294-298

ISSN No.:1000-3290

Pre One:衬底温度对直流反应磁控溅射TiN电极薄膜显微结构及导电性能的影响

Next One:钇掺杂量和膜厚对HfO2纳米薄膜相结构的影响