HWWHTGVV4qOtd1U7Vy5EkH00uZNBAqd2ipDKRZRfLZJIdeD9HcmPtLDbLDvq
Current position: Home >> Scientific Research >> Paper Publications

Facing-target mid-frequency magnetron reactive sputtered hafnium oxide film: Morphology and electrical properties

Release Time:2024-04-29  Hits:

Date of Publication: 2022-10-02

Journal: JOURNAL OF THE KOREAN PHYSICAL SOCIETY

Volume: 68

Issue: 5

Page Number: 679-685

ISSN: 0374-4884

Prev One:Endurance properties of silicon-doped hafnium oxide ferroelectric and antiferroelectric-like thin films: A comparative study and prediction

Next One:Ferroelectric properties of pure ZrO2 thin films by chemical solution deposition