Release Time:2024-04-29 Hits:
Date of Publication: 2022-10-02
Journal: JOURNAL OF THE KOREAN PHYSICAL SOCIETY
Volume: 68
Issue: 5
Page Number: 679-685
ISSN: 0374-4884
Prev One:Endurance properties of silicon-doped hafnium oxide ferroelectric and antiferroelectric-like thin films: A comparative study and prediction
Next One:Ferroelectric properties of pure ZrO2 thin films by chemical solution deposition