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Facing-target mid-frequency magnetron reactive sputtered hafnium oxide film: Morphology and electrical properties

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Date of Publication:2022-10-02

Journal:JOURNAL OF THE KOREAN PHYSICAL SOCIETY

Volume:68

Issue:5

Page Number:679-685

ISSN No.:0374-4884

Pre One:Endurance properties of silicon-doped hafnium oxide ferroelectric and antiferroelectric-like thin films: A comparative study and prediction

Next One:Ferroelectric properties of pure ZrO2 thin films by chemical solution deposition
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