Optimizing the PECVD Process for Stress-Controlled Silicon Nitride Films: Enhancement of Tensile Stress via UV Curing and Layered Deposition
Release Time:2026-03-17 Hits:
Indexed by: Journal Papers
Document Code: 481215
Date of Publication: 2025-06-12
Journal: COATINGS
Volume: 15
Issue: 6
ISSN: 2079-6412
Key Words: CHEMICAL-VAPOR-DEPOSITION; HYDROGEN; SIN DEPOSITION; THIN-FILMS