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Indexed by:期刊论文

Date of Publication:2016-11-01

Journal:OPTICAL ENGINEERING

Included Journals:SCIE

Volume:55

Issue:11

ISSN No.:0091-3286

Key Words:multimode interference; optical splitter; polymer; nanoimprint lithography

Abstract:A polymer-based multimode interference optical splitter chip has been designed and fabricated. Fiber-waveguide coupling loss as well as the structure of the multimode waveguide are optimized in the design to achieve higher performance. A simple UV-based soft nanoimprint lithography (Soft UV-NIL) technique is adopted in the fabrication. Fluorinated acrylate resins, LFR, with different refractive indices are used in this work. Both the residual layer and waveguide deformation are improved by controlling the fabrication processes. An average of 12.98 dB insertion loss is obtained from 1 x 4 splitters with 1.08 dB uniformity and 0.05 dB polarization-dependent loss. The validity of the polymer optical splitters fabricated through Soft UV-NIL technique is demonstrated by software simulation as well as experimental works. (C) 2016 Society of Photo-Optical Instrumentation Engineers (SPIE)