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姜大川

Associate Professor
Supervisor of Master's Candidates


Title : 中国产学研合作促进会常务理事
Gender:Male
Alma Mater:大连理工大学
Degree:Doctoral Degree
School/Department:材料科学与工程学院
Discipline:Materials Science
Business Address:新三束实验室209
Contact Information:0411-84709784
E-Mail:jdc@dlut.edu.cn
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Current position: Home >> Scientific Research >> Paper Publications

Exploration on the removal of arsenic in silicon under electron beam melting condition

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Indexed by:期刊论文

Date of Publication:2019-08-01

Journal:VACUUM

Included Journals:SCIE、EI

Volume:166

Page Number:191-195

ISSN No.:0042-207X

Key Words:Electron beam melting; arsenic; Evaporation; Removal; Morphology

Abstract:Arsenic is one of the main impurity elements in silicon. Electron beam melting (EBM) is considered an effective method for the purification of silicon. The removal of arsenic from silicon is performed by electron beam solidification furnace in this paper. The results demonstrated that arsenic could be removed effectively by EBM process with the average removal efficiency up to 95.4% and show the morphology of silicon ingot is less essential to distribution of arsenic impurities in the silicon ingot. The evaporation behavior of arsenic atoms is more important in the process of arsenic removal by EBM. The relationship between the evaporation coefficient of arsenic impurities and temperature was deduced. It provides a reference for further research on removal arsenic in silicon by EBM.