location: Current position: Home >> Scientific Research >> Paper Publications

Effect of temperature gradient on the diffusion layer thickness of impurities during directional solidification process

Hits:

Date of Publication:2018-01-01

Journal:MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING

Affiliation of Author(s):材料科学与工程学院

Volume:74

Page Number:102-108

ISSN No.:1369-8001

Pre One:Effect of alternating magnetic field on the removal of metal impurities

Next One:Exploration on the removal of arsenic in silicon under electron beam melting condition