Hits:

Indexed by:期刊论文

Date of Publication:2017-04-07

Journal:CHEMCATCHEM

Included Journals:SCIE、EI

Volume:9

Issue:7

Page Number:1337-1342

ISSN No.:1867-3880

Key Words:chemical vapor deposition; hydrogenation; nickel; silicon; supported catalysts

Abstract:Metal silicide (Pd2Si, Ni2Si, CoSi, FexSi, and Cu6.69Si) catalysts supported by SBA-15 have been prepared by a chemical vapor deposition method under a H-2 atmosphere using (CH3)(2)SiCl2 as the Si source. Of the SBA-15-supported metal silicide catalysts, Ni2Si/SBA-15 presented a modest activity, notable selectivity to styrene (>90%), and high stability with respect to the selective hydrogenation of phenylacetylene, which is attributed to the active-site isolation and electron transfer in the silicide. Furthermore, Ni2Si/SBA-15 also has a high selectivity to diphenylacetylene and 1,4-butynediol, which demonstrates that Ni2Si/SBA-15 is a promising, low-cost catalyst alternative to noble-metal catalysts as a selective hydrogenation catalyst.