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Preparation and Formation Mechanism of Highly Dispersed Manganese Silicide on Silica by MOCVD of Mn(CO)(5)SiCl3

Release Time:2022-10-19  Hits:

Date of Publication: 2022-10-08

Journal: CHEMICAL VAPOR DEPOSITION

Volume: 19

Issue: 1-3

Page Number: 68-73

ISSN: 0948-1907

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