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Preparation and Formation Mechanism of Highly Dispersed Manganese Silicide on Silica by MOCVD of Mn(CO)(5)SiCl3

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Date of Publication:2022-10-08

Journal:CHEMICAL VAPOR DEPOSITION

Volume:19

Issue:1-3

Page Number:68-73

ISSN No.:0948-1907

Pre One:Polyvinyl alcohol protected Mo2C/Mo2N multicomponent electrocatalysts with controlled morphology for hydrogen evolution reaction in acid and alkaline medium

Next One:Preparation and magnetic properties of single phase Ni2Si by reverse
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