Double-layer resist method to improve descum result when removing negative photoresist
Release Time:2022-06-09 Hits:
Date of Publication: 2019-01-01
Journal: MICRO & NANO LETTERS
Volume: 14
Issue: 6
Page Number: 694-697
ISSN: 1750-0443
Key Words: "photoresists; viscosity; etching; negative photoresist scum; low viscosity positive photoresist; AZ703; double-layer resist method; optimal retracting distance; bottom layer resist; top layer resist; top layer contact; size 8; 0 mum; size 1; 10 mum"