location： Current position: Home >> Scientific Research >> Paper Publications

Double-layer resist method to improve descum result when removing negative photoresist

Hits:

Date of Publication:2019-01-01

Journal:MICRO & NANO LETTERS

Volume:14

Issue:6

Page Number:694-697

ISSN No.:1750-0443

Key Words:"photoresists; viscosity; etching; negative photoresist scum; low viscosity positive photoresist; AZ703; double-layer resist method; optimal retracting distance; bottom layer resist; top layer resist; top layer contact; size 8; 0 mum; size 1; 10 mum"

Pre One:Wingate无氧运动过程中下肢肌肉表面肌电研究

Next One:Effect of oxygen partial pressure on crystal quality and electrical properties of RF sputtered PZT thin films under the fixed Ar flow and sputtering pressure
Recommended MA Supervisor Institutional Repository Personal Page

Address: No.2 Linggong Road, Ganjingzi District, Dalian City, Liaoning Province, P.R.C., 116024

Click : times
  • MOBILE Version
    •
    Open time:..
    The Last Update Time:..

    Mobile phone sweep