徐琴琴
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第一作者:王启搏
通讯作者:徐琴琴,银建中,韩振华,程通
合写作者:韩振华,程通
发表时间:2024-09-05
发表刊物:APPLIED SURFACE SCIENCE
卷号:669
ISSN号:0169-4332
关键字:CVD; ENERGY; FIELD; LAYERS; MOLYBDENUM-DISULFIDE; MONOLAYER MOS2; REAXFF; SULFIDATION; SULFURIZATION
上一条:Morphological evolution of MoxW1-xS2/MoS2 heterostructures modulated with a growth dynamic process by one-step chemical vapor deposition
下一条:The effect of sulfuration reaction rates with sulphur concentration gradient dependence on the growth pattern and morphological evolution of MoS2 in laminar flow