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个人信息Personal Information
副教授
硕士生导师
性别:女
毕业院校:哈尔滨工业大学
学位:博士
所在单位:化工海洋与生命学院
办公地点:D06-403-2
电子邮箱:renxuefeng@dlut.edu.cn
DMH and NA-based cyanide-free silver electroplating bath: a promising alternative to cyanide ones in microelectronics
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论文类型:期刊论文
发表时间:2021-03-05
发表刊物:IONICS
卷号:27
期号:1
页面范围:417-422
ISSN号:0947-7047
关键字:Silver electroplating; Cyanide-free; Decorative purposes; Microelectronics
摘要:To evaluate the application of mirror-bright silver deposit from 5,5-dimethylhydantoin (DMH) and nicotinic acid (NA)-based cyanide-free silver electroplating bath, the performance comparison of cyanide-free silver deposit obtained from the introduced bath with conventional cyanide-based one was carried out. The macroscopic appearance, surface morphology, adhesive strength, and welding property of the introduced mirror-bright silver deposit were determined. Equal to the cyanide-based silver electroplating bath, mirror-bright silver deposits with excellent leveling capability, and smooth and compact morphology, as well as excellent welding property could be obtained from the studied DMH and NA-based silver electroplating bath. Thus, the investigated DMH and NA-based silver electroplating bath could be a promising alternative to the conventional cyanide ones for the applications of silver electroplating in decorative purposes and microelectronics.