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个人信息Personal Information
教授
博士生导师
硕士生导师
性别：男
毕业院校：中科院上海硅酸盐研究所
学位：博士
所在单位：物理学院
学科：微电子学与固体电子学. 凝聚态物理
办公地点：大连理工大学科技园C座301-1办公室
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Influence of high-pressure hydrogen treatment on structural and electrical properties of ZnO thin films
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论文类型：期刊论文
发表时间：2010-09-01
发表刊物：APPLIED SURFACE SCIENCE
收录刊物：EI、SCIE
卷号：256
期号：22
页面范围：6770-6774
ISSN号：0169-4332
关键字：ZnO; MOCVD; High-pressure H-2; Zn(OH)(2)
摘要：ZnO thin films were treated by high-pressure hydrogen (H-2). Scanning electron microscope (SEM) images show that the surface morphology of ZnO films has been changed significantly by H-2 treatment. X-ray diffraction patterns show that the Zn(OH)(2) phases formed after H-2 treatment. The X-ray photoelectron spectroscopy results indicate that H atoms were doped into the surface of ZnO by forming H-O-Zn bond. The phenomenon shows that it is easy to form O-H bond in ZnO rather than H interstitial atom under high-pressure hydrogen circumstance. (C) 2010 Elsevier B.V. All rights reserved.