Indexed by:期刊论文

Date of Publication:2014-01-01

Journal:EXPERIMENTAL MECHANICS

Included Journals:SCIE、EI

Volume:54

Issue:1,SI

Page Number:45-55

ISSN No.:0014-4851

Key Words:Nano grating; Cross grid; Grating error analysis; Optimal parameters; SEM

Abstract:The electron-beam moir, method uses a high frequency grating to measure microscopic deformation. Increasingly fine gratings are being developed to achieve increasingly high resolutions in microscopic stress analysis. In this study, we improve the electron grid fabricating technique by using a common scanning electron microscope (SEM). An error analysis for the multi-scanning grating was performed by a sampling moir, method. The grating manufacturing parameters strongly affect the superfine grating quality. A high accelerating voltage or a short working distance yield better results generally. A set of optimal parameters is suggested based on a minimum-error criterion. A cross-line grid with a frequency of 10,000 lines/mm and a parallel grating with a frequency of 13,000 lines/mm were successfully fabricated.