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论文类型： 会议论文

发表时间： 2014-08-12

收录刊物： EI、CPCI-S

页面范围： 1164-1168

关键字： Cu/Sn-9Zn/Ni; Electromigration; Chemical potential gradient; Interfacial reaction

摘要： Different diffusion behavior of Cu, Ni and Zn atoms in Cu/Sn-9Zn/Ni interconnects during liquid-solid electromigration (L-S EM) were investigated under a current density of 5.0 x 10(3) A/cm(2) at 230 degrees C. When Cu atoms were under downwind diffusion, L-S EM enhanced the cross-solder diffusion of Cu atoms to the opposite Ni side compared with the liquid-solid reaction case, resulting in the formation of interfacial Cu5Zn8 at Ni/Sn-Zn interface, and its thickness increased at the beginning and then decreased. For the Ni atoms, L-S EM significantly enhanced the diffusion of Ni atoms to the Cu side when Ni atoms were under downwind diffusion, resulting in the formation of a large amount of (Ni, Cu)(3)(Sn, Zn)(4) at the Cu side. Under the combined effect of chemical potential gradient and electronic wind force, the Zn atoms with positive effective charge number would directional diffuse towards Cu side under both downwind and upwind diffusion conditions, as a result, the interfacial Cu5Zn8 formed at the Cu side, and its thickness continuously increased.