大连理工大学  登录  English 
黄明亮
点赞:

教授   博士生导师   硕士生导师

性别: 男

毕业院校: 大连理工大学

学位: 博士

所在单位: 材料科学与工程学院

学科: 材料学. 功能材料化学与化工. 化学工程

办公地点: 材料楼330办公室

联系方式: 0411-84706595

电子邮箱: huang@dlut.edu.cn

手机版

访问量:

开通时间: ..

最后更新时间: ..

当前位置: 黄明亮 >> 科学研究 >> 论文成果
Au-Sn Co-electroplating solution for Flip Chip-LED Bumps

点击次数:

论文类型: 会议论文

发表时间: 2010-01-01

收录刊物: EI、CPCI-S、Scopus

页面范围: 283-287

摘要: A new non-cyanide and non-toxic stable electroplating solution for co-deposition Au-Sn alloys was investigated in this study. A stable sulfite-based electroplating solution for gold and a stable solution for tin were prepared, respectively. L-ascorbic acid was added into the Au solution and a reducing agent was added into the Sn solution, and then the two solutions were mixed to generate Au-Sn solution. The effects of additives on solution stability at room temperature and high temperatures were studied. Polarization tests of Au, Sn and Au-Sn solutions were carried out to reveal the effect of additives on Au, Sn and Au-Sn plating. Then a series of electroplating tests at different current densities were performed in order to demonstrate plating capability of Au-Sn solutions. It was shown that the species of the main salt for gold affected the stability of solution prominently. EDTA could improve the stability of Au solution at high temperature and the complexing agent for Sn was also benefit to the stability of Sn solution. Two waves in Sn solutions with the complexing agent indicated two cathode reactions occurred during Sn plating. The reducing agent was added to prevent the oxidation of Sn (II), but it turned out to affect the polarization of Sn solutions and the compositions of Au-Sn alloys during co-electroplating. Electroplating experiment results showed that co-electroplating of uniform Au-Sn deposits was feasible.

辽ICP备05001357号 地址:中国·辽宁省大连市甘井子区凌工路2号 邮编:116024
版权所有:大连理工大学