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Kinetics of intermetallic compound layers and Cu dissolution at Sn1.5Cu/Cu interface under high magnetic field
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论文类型: 期刊论文
发表时间: 2010-02-01
发表刊物: JOURNAL OF MATERIALS RESEARCH
收录刊物: SCIE、EI
卷号: 25
期号: 2
页面范围: 359-367
ISSN号: 0884-2914
摘要: The kinetics of intermetallic compound (IMC) layer and Cu dissolution at Sn1.5Cu/Cu interface under high magnetic field was experimentally examined. It is found that the IMC layer growth is controlled by flux-driven ripening process. The high magnetic field promotes the growth of IMC layer, retards the dissolution of Cu substrate, and decreases the content of Cu solute at the liquid-IMC interface front. Based on the experimental results, it is considered that the magnetization induced by magnetic field promotes the ripening process for IMC layer growth. The Lorentz force dampening the convection and magnetization decreasing the Cu solubility limit can retard the Cu dissolution and change the solute distribution at the liquid-IMC interface front.

程从前

副教授   博士生导师   硕士生导师

任职 : 院长助理,中国腐蚀与防护学会高温专业委员会委员,中国机械工程学会理化检验分委员会委员,辽宁省化工学会腐蚀与防护专业委员会委员

性别: 男

毕业院校:大连理工大学

学位: 博士

所在单位:材料科学与工程学院

学科:材料学

电子邮箱:cqcheng@dlut.edu.cn

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