NAME

John Wu

Paper Publications

Fabrication and its characteristics of low-temperature polycrystalline silicon thin films
  • Hits:
  • Indexed by:

    会议论文

  • First Author:

    吴爱民

  • Co-author:

    秦福文

  • Date of Publication:

    2008-01-01

  • Document Type:

    A

Pre One:The two-step growth of poly-Si thin film by ECR-PECVD

Next One:基于电子回旋共振-等离子体增强金属有机物化学气相沉积技术生长GaMnN稀磁半导体的研究