Influence of Ar/H2 ratio on the characteristics of phosphorus-doped hydrogenated nanocrystalline silicon films prepared by electron cyclotron resonance plasma-enhanced chemical vapor deposition
Release Time:2019-03-12 Hits:
Indexed by: Journal Article
Date of Publication: 2012-01-01
Journal: thin solid film
Volume: 521
Issue: 10
Page Number: 181-184