location: Current position: Aimin Wu >> Scientific Research >> Paper Publications

升级冶金级Si衬底上ECR-PECVD沉积多晶Si薄膜

Hits:

Date of Publication:2022-10-09

Journal:半导体技术

Affiliation of Author(s):材料科学与工程学院

Issue:2

Page Number:117-120

ISSN No.:1003-353X

Note:新增回溯数据

Pre One:“卓越工程师教育培养计划”中文献研讨互动教学模式达成与实践

Next One:原位硫化制备SnS/SnS2纳米片及光学特性