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Date of Publication:2022-10-06

Journal:金属学报

Volume:47

Issue:05

Page Number:628-633

ISSN No.:0412-1961

Abstract:Aluminum magnesium boron ternary boride (AlMgB(14)) possesses high hardness, high-temperature oxidation resistance, high temperature corrosion resistance, low density, low friction and other excellent properties, and could be widely used in tool, mold, micro-mechanical manufacture and aerospace, et al. In this paper, Al-Mg-B films have been prepared by multi-target (high pure aluminum, magnesium and boron targets) magnetron sputtering on the silicon (100) substrate at room temperature. The films with an atomic ratio of Al : Mg : B= 1 : 1 : 14 were obtained by controlling the sputtering power and the volume ratio of Al/Mg co-target. X-ray diffraction (XRD) and High resolution transmission electron microscopy (HR-TEM) test results show that all the as-deposited films are amorphous. The X-ray photoelectron spectroscopy (XPS) results showe that there are some B-B and Al-B single bond in the as-deposited films, and the Fourier transform infrared spectroscopy (FTIR) tests indicate further that the films possess B(12) icosahedra structure. The hardness of the films as shown by nano indentor test will be increasing with the increase of content of B around B-AlMg isoelectronic line and close to boron-rich side, and up to 32 GPa with low friction coefficients of 0.06-0.08.

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