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发布时间：2023-03-30

发表时间：2022-10-06

发表刊物：大连理工大学学报

期号：3

页面范围：298-302

ISSN号：1000-8608

摘要：Hard amorphous BCMg thin films were successfully deposited on the surface of Si(001)via multi-target magnetron co-sputtering technique at 573 K.High-purity B,C and Mg elemental disks were used as sputtering targets.Back scattering SEM image illustrates that deposited BCMg coating has a uniform component distribution and a well-adherence with Si substrate.XPS results reveal the existence of B-B,B-C and C-Mg bonds.XRD and HRTEM results show that the deposited films are in amorphous structure.With the augment of target power,the corresponding elemental content and the overall deposition rate are enlarged.As B content is raised,leading to the increase of covalent B-B bonds,both the hardness and fracture toughness of BCMg thin films increase.Especially,when the B content reaches 85%,the hardness and fracture toughness of BCMg thin film are respectively 3 3 .9 GPa and 3 MPa·m1/2 .

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