副教授 博士生导师 硕士生导师
任职 : 辽宁省能源材料及器件重点实验室副主任
性别: 男
毕业院校: 大连理工大学
学位: 博士
所在单位: 材料科学与工程学院
学科: 材料物理与化学. 材料表面工程
办公地点: 新三束4#楼311室
联系方式: 0411-84706661-101
电子邮箱: aimin@dlut.edu.cn
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论文类型: 期刊论文
发表时间: 2012-04-01
发表刊物: RARE METALS
收录刊物: SCIE、EI
卷号: 31
期号: 2
页面范围: 178-182
ISSN号: 1001-0521
关键字: Ti-Al-N; DC magnetron sputtering; phase transition; hardness
摘要: Pseudobinary Ti1-x Al (x) N films were synthesized on Si (100) wafer by DC magnetron sputtering method using Ti1-x Al (x) alloy targets with different Al contents. The composition of the Ti1-x Al (x) N films was determined by electron probe microanalysis (EPMA). Structural characteristic was performed by X-ray diffraction (XRD), transmission electron microscopy (TEM), and high-resolution TEM (HRTEM). First principles virtual crystal calculations for the Ti1-x Al (x) N disordered alloys were used for the XRD simulations. The crystalline structure of the Ti0.61Al0.39N film was found to be a metastable single phase with NaCl (B1) structure. Its lattice constant, determined by XRD, was less than that of pure TiN. With the increase of Al content, the lattice constant of B1 phase was continually decreased, while wurtzite (B4) structure was observed in the Ti0.40Al0.60N film. When x reached 0.75, the B1 phase disappeared, and only B4 phase was remained. The critical Al content for the phase transition from NaCl to wurtzite structure in this paper was about 0.60, which could be explained by both the thermodynamic model and the electron theory. As-deposited Ti1-x Al (x) N films exhibited excellent mechanical properties. Hardness measurements of Ti1-x Al (x) N films showed a high value of 45GPa for x=0.39 and was decreased to value of 27 GPa with increasing Al at x=0.60.