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Indexed by:期刊论文

Date of Publication:2010-04-01

Journal:PLASMA SCIENCE & TECHNOLOGY

Included Journals:EI、SCIE

Volume:12

Issue:2

Page Number:166-171

ISSN No.:1009-0630

Key Words:OH; dielectric barrier discharge; plasma; cavity ring-down spectroscopy

Abstract:Near-infrared continuous wave cavity ring-down spectroscopy was applied to measure the OH radicals in dielectric barrier discharge plasmas, which play an important role in combustion systems, atmospheric chemistry and the removal of air pollutants by non-thermal plasmas. The P-branches of OH X(2)Pi(i) (nu' = 2 <- nu '' = 0) bands were used for number density measurements. The OH number density and plasma temperature were determined for direrent applied voltages, gas pressures and concentrations of both oxygen and water. The temporal evolution of the OH number density was obtained by using the \time window" method, which was used to extract individual ring-down times at direrent times in a half period of the sine wave applied voltage indielectric barrierd is charge plasmas.