点击次数：

论文类型：会议论文

发表时间：2011-01-01

收录刊物：Scopus

摘要：TiO2 films play an important role in various applications, e.g., photocatalysis, photovoltaics, and biocompatibility. A wire-to-plate dielectric barrier discharge (DBD) induced plasma CVD device was used to fabricate photocatalytically active TiO2 films on moving glass or plastic substrates at 1 atm. The discharge gap had an adjustable distance of 0.3-0.6 mm. The photocatalytic reaction test for TiO2 films was performed by complete oxidation of HCHO in simulated air with a continuous flow reactor. The as-deposited TiO2 films on cover glass or plastic substrates exhibited high photocatalytic activity. The apparent rate constants of the TiO2 films on cover glass and plastic substrates were 0.99 and 0.52/sec, respectively. The influence of input power, discharge gap, and the partial pressure of TiCl4 on the photocatalytic activity of the as-deposited TiO2 films were also investigated. This is an abstract of a paper presented at the 2011 AIChE Spring Meeting & 7th Global Congress on Process Safety (Chicago, IL 3/13-17/2011).