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论文类型：期刊论文

发表时间：2012-12-01

发表刊物：CHEMICAL VAPOR DEPOSITION

收录刊物：Scopus、SCIE

卷号：18

期号：10-12

页面范围：309-314

ISSN号：0948-1907

关键字：AP plasma CVD; Dielectric barrier discharge; TiO2 photocatalytic film

摘要：Atmospheric-pressure (AP) linear cold plasma CVD is employed to deposit TiO2 photocatalytic films uniformly on a moving substrate. The in-plane and in-depth uniformities of the as-deposited TiO2 films are investigated by scanning electron microscopy (SEM) and UV-vis spectroscopy. The chemical binding states and compositions of the as-deposited TiO2 films are characterized by X-ray photoelectron spectroscopy (XPS). Raman, X-ray diffraction (XRD), and Fourier transform infrared (FTIR) spectra prove the structures of the as-deposited and calcined TiO2 films are mainly hydro-oxygenated amorphous (a-TiOx:OH), and exclusively anatase, respectively. The photocatalytic activity of the as-deposited and calcined TiO2 films is evaluated in a continuous flow reactor for HCHO removal with simulated air. The activity of the as-deposited TiO2 films increases with film thickness, leveling off at about 780?nm. The activity of the as-deposited TiO2 film is lower than that of the calcined one.