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论文类型：期刊论文

发表时间：2011-02-01

发表刊物：PLASMA SCIENCE & TECHNOLOGY

收录刊物：Scopus、SCIE、EI

卷号：13

期号：1

页面范围：61-67

ISSN号：1009-0630

关键字：dual frequency; capacitively coupled plasma; optical probe; plasma uniformity

摘要：Local measurement of plasma radial uniformity was performed in a dual frequency capacitively coupled argon plasma (DF-CCP) reactor using an optical probe. The optical probe collects the light emission from a small separate volume in plasma, thus enabling to diagnose the plasma uniformity for different experimental parameters. Both the gas pressure and the low-frequency (LF) power have apparent effects on the radial uniformity of argon plasma. With the increase in either pressure or LF power, the emission profiles changed from a bell-shaped to a double-peak distribution. The influence of a fused-silica ring around the electrodes on the plasma uniformity was also studied using the optical probe. Possible reasons that result in nonuniform plasmas in our experiments are discussed.