Current position: Home >> Scientific Research >> Paper Publications

Scratch behavior and FEM modelling of Cu/Si(100) thin films deposited by modulated pulsed power magnetron sputtering

Release Time:2019-03-13  Hits:

Indexed by: Conference Paper

Date of Publication: 2019-01-01

Volume: 363

Page Number: 25-33

Prev One:Scratch behavior and FEM modelling of Cu/Si(100) thin films deposited by modulated pulsed power magnetron sputtering

Next One:Flexible hard TiAlSiN nanocomposite coatings deposited by modulated pulsed power magnetron sputtering with controllable peak power
Recommended Ph.D.Supervisor Recommended MA Supervisor Institutional Repository Personal Page

Address: No.2 Linggong Road, Ganjingzi District, Dalian City, Liaoning Province, P.R.C., 116024

Click:Times MOBILE Version
The Founding Time : ..
The Last Update Time : ..

Mobile phone sweep