点击次数：

论文类型：期刊论文

发表时间：2012-06-01

发表刊物：MATERIALS EXPRESS

收录刊物：SCIE、Scopus

卷号：2

期号：2

页面范围：157-163

ISSN号：2158-5849

关键字：Silicon Oxide; CVD; Ferric Chloride; Nanowires Assembly; VLS

摘要：Silicon oxide (SiOx) nanowire assemblies have been synthesized using anhydrous ferric chloride (FeCl3) as a catalyst precursor and silicon wafers as both the silicon source and substrate by means of floating catalyst chemical vapor deposition (CVD) in order to produce different morphologies. It is found that the growth and morphology of SiOx is strongly temperature-dependent, as tested within the temperature range 1000-1200 degrees C. The sublimation of FeCl3 and its subsequent reduction in the gas phase to produce Fe nanoparticles with high catalytic activity allows for the efficient growth of SiOx nanowires via vapor liquid solid (VLS) mechanism. The prepared amorphous SiOx nanowires show photoluminescence and emit blue light. This floating catalyst method offers a simple and comprehensive approach for the large-scale production of SiOx nanostructures with tunable assemblies.