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Indexed by:期刊论文

Date of Publication:2008-07-01

Journal:European Congress and Exhibition on Advanced Materials and Processes (Euromat 2007)

Included Journals:SCIE、EI、CPCI-S

Volume:10

Issue:7

Page Number:628-633

ISSN No.:1438-1656

Abstract:A study was conducted using optical emission spectroscopy (OES) diagnose system to identify information about the formation of ions and radicals in plasma. The substrate was polarized by RF discharge during DC reactive magnetron sputtering process, while the recorded OES signals near both target and substrate were investigated as a function of RF bias. OES signals show that the main chemical reaction process occurred on substrate surface and the signal ratio can be used to predict the composition evolution. The mutual coupling between magnetron and RF capacity discharge at high RF bias enhanced sputtering Cr flux while reduced the reaction nitrogen on substrate surface. The study results also identifed ion bombardment effects and found that a favorable bias ranging from 60 V to 100 V can make coating dense and improve their mechanical properties.