C掺杂对离子注入合成beta- FeSi_2 薄膜的影响
Release Time:2019-03-12 Hits:
Indexed by: Journal Article
Date of Publication: 2001-01-01
Journal: 半导体学报
Included Journals: CSCD
Volume: 22
Issue: 12
Page Number: 1507
ISSN: 0253-4177
Key Words: 半导体薄膜; 金属硅化物; 离子注入; 透射电子显微镜