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C掺杂对离子注入合成beta- FeSi_2 薄膜的影响

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Indexed by:期刊论文

Date of Publication:2001-01-01

Journal:半导体学报

Included Journals:CSCD

Volume:22

Issue:12

Page Number:1507

ISSN No.:0253-4177

Key Words:半导体薄膜; 金属硅化物; 离子注入; 透射电子显微镜

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