Release Time:2019-03-12 Hits:
Indexed by: Journal Article
Date of Publication: 1997-01-01
Journal: 大连理工大学学报
Included Journals: CSCD、PKU
Volume: 37
Issue: 2
Page Number: 234
ISSN: 1000-8608
Key Words: 离子源; 离子注入; 硅化物; 电子显微镜分析
Prev One:离子注入形成FeSi_2埋层的电镜研究
Next One:非周期结构与准晶