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离子注入形成FeSi2埋层的电镜研究

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Indexed by:期刊论文

Date of Publication:1997-01-01

Journal:大连理工大学学报

Included Journals:PKU、CSCD

Volume:37

Issue:2

Page Number:234

ISSN No.:1000-8608

Key Words:离子源; 离子注入; 硅化物; 电子显微镜分析

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