Current position: Home >> Scientific Research >> Paper Publications

离子注入形成FeSi2埋层的电镜研究

Release Time:2019-03-12  Hits:

Indexed by: Journal Article

Date of Publication: 1997-01-01

Journal: 大连理工大学学报

Included Journals: CSCD、PKU

Volume: 37

Issue: 2

Page Number: 234

ISSN: 1000-8608

Key Words: 离子源; 离子注入; 硅化物; 电子显微镜分析

Prev One:离子注入形成FeSi_2埋层的电镜研究

Next One:非周期结构与准晶