Hits:

Indexed by:期刊论文

Date of Publication:2009-09-01

Journal:JOURNAL OF MATERIALS SCIENCE & TECHNOLOGY

Included Journals:SCIE、EI、ISTIC、Scopus

Volume:25

Issue:5

Page Number:681-686

ISSN No.:1005-0302

Key Words:Arc ion plating; Pulsed bias; TiN film; Droplet-particles

Abstract:Orthogonal experiments are used to design the pulsed bias related parameters, including bias magnitude, duty cycle and pulse frequency, during arc ion deposition of TiN films on stainless steel substrates in the case of samples placing normal to the plasma flux. The effect of these parameters on the amount and the size distribution of droplet-particles are investigated, and the results have provided sufficient evidence for the physical model, in which particles reduction is due to the case that the particles are negatively charged and repulsed from negative pulse electric field. The effect of sample configuration on amount and size distribution of the particles are analyzed The results of the amount and size distribution of the particles are compared to those in the case of samples placing parallel to the plasma flux.