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论文类型：会议论文

发表时间：2010-06-26

收录刊物：EI、CPCI-S、SCIE、Scopus

卷号：675-677

页面范围：1205-+

关键字：high current pulsed electron beam; surface treatment; microstructure; property

摘要：High current pulsed electron beam (HCPEB) has been developed as a useful tool for surface treatment of materials. In the present work, the fundamental principle of HCPEB source was described along with the device configuration and working parameters. Through the different kinds of HCPEB surface treatment experiments conducted, the enhanced surface properties induced by HPCEB treatment were illustrated and explained with their microstructure characterization results.